[Synergy of Technology×Technique]
Electron Beam Lithography System—Facilitating Research on Advanced Devices by Sharing Expertise in Evolving Microfabrication Techniques

• Engineers
• Processing Techniques
• Research Network and Facility Services Division Platforms
• Shared Facilities

The Nanofabrication Unit provides shared access to a cleanroom and over 50 microfabrication and evaluation equipment to support research on materials and processing technologies for advanced devices, primarily based on semiconductor materials. This one-stop facility provides essential process technologies for electronic and optical device R&D, including lithography, thin-film deposition, etching, and device performance evaluation. Among these equipment, the electron beam lithography system (JBX-8100FS) has gained significant attention and a strong reputation in recent years. It enables nanometer-scale patterning on semiconductors and other substrates. The primary advantages of the JBX-8100FS are advanced lithographic miniaturization, high-speed patterning, and exceptional accuracy. With a maximum acceleration voltage of 200 kV, the system achieves a finer electron beam focus than conventional models, enabling more precise patterning. Under identical conditions, it reduces the patterning time for periodic structures requiring long processing to one-fifth, significantly accelerating R&D. Additionally, in multilayer devices, alignment accuracy between layers affects performance, and the JBX-8100FS minimizes layer misalignment to within ±10 nm.

Our role as engineers is to maximize the potential of our equipment and provide the best possible support to users. For the JBX-8100FS, we continuously evaluate lithographic conditions to push the limits of miniaturization and patterning speed. In addition, all engineers in our unit undergo rigorous training to operate every equipment, ensuring consistently high-quality service at any time. The essence of manufacturing is in exploring the optimum equipment and processes for shaping materials, forming circuits, and building device structures. We are committed to continuously evolving as engineers who can meet user demands, staying attuned to new knowledge and technologies while honing our skills.

Electron Beam Lithography System［JBX-8100FS］

Manufacturer: JEOL Ltd.

〈Usage Type〉
Self-operation: Users independently operate the equipment and perform analysis.
Guided-operation: Users operate the equipment with assistance and guidance from NIMS staff.
Staff-operated Service: NIMS staff operate the equipment and perform analysis on behalf of users.

NIMS Open Facility: Use under Non-public Access

ARIM: Use under Public Access